Materials and processes for next generation lithography / 
edited by Alex Robinson, Richard Lawson. 
 - Amsterdam :  Elsevier ,  2016 
 - 608 p. 
<br/><br/>Volume 11 / 00041002746 
<br/><br/><label>ISBN: </label>9780081003541 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Nanolithography.<br/>Photoresists.<br/>Microlithography.<br/>Kỹ thuật in<br/>Vật liệu in
<br/><br/><label>Dewey Class. No.: </label>621.38153  / MAT 2016