Normal view MARC view ISBD view

Materials and processes for next generation lithography /

Materials and processes for next generation lithography / edited by Alex Robinson, Richard Lawson. - Amsterdam : Elsevier , 2016 - 608 p.

Volume 11 / 00041002746

ISBN: 9780081003541

Subjects--Topical Terms:
Nanolithography.
Photoresists.
Microlithography.
Kỹ thuật in
Vật liệu in

Dewey Class. No.: 621.38153 / MAT 2016

Print
Add to your cart (remove)
Send to device

Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS ISBD
More searches

Search for this title in:
Other Libraries (WorldCat) Other Databases (Google Scholar) Online Stores (Bookfinder.com) Open Library (openlibrary.org)

Materials and processes for next generation lithography /

Connect with us